Inabata America is the exclusive agent for Ulcoat Photomask Blanks in North American Market.
Hard Mask Blanks are one of the key materials for the manufacture of the LSI and ULSI.The Integrated Circuit productions require the imaging of the circuit designs even to the 90nm below, and Photomask are the critical component as the mother patterning board.
Semiconductor related marketPhotomask Blanks from ULCOAT Japan
- Binary Mask Blanks (chrome): 4”x4”, 5”x5”, 6”x6” 7”x7” (various thickness & flatness available)
- Phase Shift Mask Blanks (MoSi): 6”x6”x.25”
- Material: Sodalime & Quartz
- Resist: AZP1350, IP3500, IP3600, 895i, ZEP7000, FEP171
Large Area Photomask Blanks from ULCOAT Taiwan
- Size: 8”x8” ~ 52”x54” (various sizes available)
- Material: Soalime & Quartz
- Resist: TFP650, AZ1500

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